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Scozzoli L.; Reggiani S.; Rudan M., Homogeneous transport in silicon dioxide using the spherical-harmonics expansion of the BTE, in: International Conference on Simulation of Semiconductor Processes and Devices, SISPAD, Piscataway, NJ, United States, IEEE, 1999, pp. 251 - 254 (atti di: Proceedings of the 1999 International Conference on Simulation of Semicondutor Processes and Devices (SISPAD'99), Kyoto, Jpn,, 1999) [Contribution to conference proceedings]
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